2024年4月11日发(作者：)

专利内容由知识产权出版社提供

专利名称：Substrate inspection system and substrate

inspection method

发明人：長 濱 一郎太,山 崎 裕一郎,永 井 隆 光,三 好 元 介

申请号：JP2001090934

申请日：20010327

公开号：JP4334159B2

公开日：20090930

摘要：PROBLEM TO BE SOLVED: To provide a substrate-check system and a method

for checking a substrate which reduces the distortion and contrast ununiformity of an

observation image of a substrate surface. SOLUTION: The substrate-check system 100 is

composed of a first optical system 1 for irradiating an electron beam 5 to the substrate

42 of an object to be checked, an electron detector 3 which detects a secondary electron

emitted from the surface of the substrate 42 by receiving the irradiation of the electron

beam 5 as a secondary electron and outputs the secondary electron as an image signal of

an image showing a surface state of the substrate 42, a deflection means 41 which puts

the electron beam 5 into the surface of the substrate 42 by deflecting it and advances a

secondary beam 6 straight, a secondary optical system 2 which scales up the secondary

beam 6 to image on the electron detector 3. Moreover, the system 100 is equipped with

an electron gun 80 which irradiates an electron beam 75 to the substrate 42 before

checking, and a mesh electrode 92 which is located between the electron gun 80 and the

substrate 42 and to which a voltage Vm is applied to have potential energy above the

energy of a secondary electron es mitted from the substrate 42.

申请人：株式会社東芝

地址：東京都港区芝浦一丁目１番１号

国籍：JP

代理人：吉武 賢次,橘谷 英俊,佐藤 泰和,吉元 弘,川崎 康,箱崎 幸雄

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