2024年4月23日发(作者：)
专利内容由知识产权出版社提供
专利名称：METHOD FOR DUDGING POSITION
ACCURACY AND POSITIONING METHOD
发明人：NISHIKAWA HIROSHI,西川 寛
申请号：JP特願平7-265028
申请日：19950918
公开号：JP特開平9-80765A
公开日：19970328
专利附图：
摘要：PROBLEM TO BE SOLVED: To make it possible to position first and second
masks for exposure to be used in superposition with good accuracy by judging the
positioning accuracy of the first and second masks for exposure to be used in
superposition with good accuracy. SOLUTION: The first and second polarizing regions are
provided corresponding to first and second masks 10, 15 for exposure respectively. The
positioning accuracy is judged in accordance with the quantity of the light transmitted
through both of the respective first and second polarizing regions when the first and
second masks 10, 15 for exposure are positioned in superposition, thereby, the
mispositioning quantity can be quantitatively measured. The first and second polarizing
regions are provided corresponding to the first and second masks 10, 15 for exposure
respectively and the first and second masks 10, 15 for exposure are superposed on each
other and are positioned in accordance with the quantity of the light transmitted through
both of the respective first and second polarizing regions, thereby, the masks are
positioned while the mispositioning quantity is quantitatively measured.
申请人：SONY CORP,ソニー株式会社
地址：東京都品川区北品川6丁目7番35号
国籍：JP
代理人：田辺 恵基
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